5 hasil untuk "- Burhanuddin"
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Artikel Jurnal Teks lengkap
Exploiting the Oxygen Inhibitory Effect on UV Curing in Microfabrication: A Modified Lithography Technique
Rapid prototyping (RP) of microfluidic channels in liquid photopolymers using standard lithography (SL) involves multiple deposition steps and curing by ultraviolet (UV) light for the construction of a microstructure layer. In this work, the conflicting effect of oxygen diffusion and UV curing of…
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Artikel Jurnal Teks lengkap
Gate Length Variation Effect on Performance of Gate-First Self-Aligned In 0.53 Ga 0.47 As MOSFET
A multi-gate n-type In0.53Ga0.47As MOSFET is fabricated using gate-first self-aligned method and air-bridge technology. The devices with different gate lengths were fabricated with the Al2O3 oxide layer with the thickness of 8 nm. In this letter, impact of gate length variation on device parameter…
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Artikel Jurnal Teks lengkap
Effect of Geometric Parameters on the Performance of P-Type Junctionless Lateral Gate Transistors
This paper examines the impact of two important geometrical parameters, namely the thickness and source/drain extensions on the performance of low doped p-type double lateral gate junctionless transistors (DGJLTs). The three dimensional Technology Computer-Aided Design simulation is implemented to…
Dari koleksi institusi
- Analisis administrasi manajemen dan kepemimpinan pendidikanBurhanuddin · 1994 · Universitas Riau (UNRI)
- Proses Pengambilan Keputusan Dalam Memanajemen Keruntuhan lereng Dengan Metode Specific time horizon (STH)Burhanuddin · Universitas Riau (UNRI)
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Artikel Jurnal Teks lengkap
Urea and creatinine detection on nano-laminated gold thin film using Kretschmann-based surface plasmon resonance biosensor
This work investigates the surface plasmon resonance (SPR) response of 50-nm thick nano-laminated gold film using Kretschmann-based biosensing for detection of urea and creatinine in solution of various concentrations (non-enzymatic samples). Comparison was made with the presence of urease and…
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Artikel Jurnal Teks lengkap
Impact of Parameter Variation in Fabrication of Nanostructure by Atomic Force Microscopy Nanolithography
In this letter, we investigate the fabrication of Silicon nanostructure patterned on lightly doped (1015 cm−3) p-type silicon-on-insulator by atomic force microscope nanolithography technique. The local anodic oxidation followed by two wet etching steps, potassium hydroxide etching for silicon…