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Jurnal

Applied Surface Science

Scopus

ISSN 0169-4332 · Elsevier BV · 5 artikel di indeks

  1. Artikel Jurnal

    Defining the nature of adventitious carbon and improving its merit as a charge correction reference for XPS

    Lauren H. Grey; Heng‐Yong Nie; Mark C. Biesinger

    Applied Surface Science · 2024 · Inggris · OpenAlex Scopus

    The chemical nature of adventitious carbon (AdC), a thin layer of carbonaceous material that deposits on the surface of most air-exposed samples and is widely used for charge correction of insulating materials in X-ray photoelectron spectroscopy (XPS), has been investigated by XPS and…

  2. Artikel Jurnal Teks lengkap

    Binding energy referencing in X-ray photoelectron spectroscopy: Expanded data set confirms that adventitious carbon aligns to the sample vacuum level

    Grzegorz Greczyński

    Applied Surface Science · 2024 · Inggris · OpenAlex Scopus

    The correct referencing of the binding energy scale is essential for the accuracy of chemical analysis by X-ray photoelectron spectroscopy. The C 1s C–C/C–H peak from adventitious carbon (AdC), most commonly used for that purpose, was previously shown to shift by several eVs following changes in…

  3. Artikel Jurnal Teks lengkap

    Referencing to adventitious carbon in X-ray photoelectron spectroscopy: Can differential charging explain C 1s peak shifts?

    Grzegorz Greczyński; Lars Hultman

    Applied Surface Science · 2022 · Inggris · OpenAlex Scopus

    C 1s peak of adventitious carbon (AdC), often used for charge referencing XPS spectra, shows markedly large shifts from the “recommended” value of 284.8 eV that basically disqualifies its reliability. In some earlier papers we attributed this spreading effect to the vacuum level (VL) alignment at…

  4. Artikel Jurnal Teks lengkap

    Towards reliable X-ray photoelectron spectroscopy: Sputter-damage effects in transition metal borides, carbides, nitrides, and oxides

    Grzegorz Greczyński; Lars Hultman

    Applied Surface Science · 2020 · Inggris · OpenAlex Scopus

    Ar+ sputter etching is often used prior to X-ray photoelectron spectroscopy (XPS) analyses with the intention to remove surface oxides and contaminants. Since the XPS probing depth is comparable to the thickness of the ion-beam modified layer the signal from the latter dominates the spectra. We…